6.777J/2.751J Material Property
Database
Material: Polyimide
| Property | Value | Reference | Image/URL (optional) | 
| 
 | 1.42 g/cc | “Dupont Kapton Polyimide Film General Specifications,
  Bulletin GS-96-7”. 
  http://www.dupont.com/kapton/general/H-38479-4.pdf |  | 
| Young's modulus | 2.5 GPa | “Dupont Kapton Polyimide Film General Specifications,
  Bulletin GS-96-7”. 
  http://www.dupont.com/kapton/general/H-38479-4.pdf |  | 
| Poisson ratio | 0.34 @ 23°C | “Dupont Kapton Polyimide Film General Specifications,
  Bulletin GS-96-7”.  http://www.dupont.com/kapton/general/H-38479-4.pdf |  | 
| Stiffness Constants (if crystalline) |  |  |  | 
| Tensile strength | 231 MPa
  @ 23°C 139 MPa
  @ 200°C | “Dupont Kapton Polyimide Film General Specifications,
  Bulletin GS-96-7”. 
  http://www.dupont.com/kapton/general/H-38479-4.pdf |  | 
| Residual stress on silicon | 35MPa @5 μm
  , on 8” wafer, 375°C cure  | “Photodefinable HD-4000 Series Polyimide Product
  Bulletin.” 
  http://www.hdmicrosystems.com |  | 
| Specific heat | 1.09 J/(g*K) 0.261 cal/(g*°C) | “Dupont Kapton Polyimide Film General Specifications,
  Bulletin GS-96-7”.  http://www.dupont.com/kapton/general/H-38479-4.pdf |  | 
| Thermal conductivity | 0.12 W/(mK) 2.87e-4 cal/(cm*sec*°C) | “Dupont Kapton Polyimide Film General Specifications,
  Bulletin GS-96-7”. 
  http://www.dupont.com/kapton/general/H-38479-4.pdf |  | 
| Dielectric constant | 3.4 @ 25 μm,
  1kHz | “Dupont Kapton Polyimide Film General Specifications,
  Bulletin GS-96-7”. 
  http://www.dupont.com/kapton/general/H-38479-4.pdf |  | 
| Index of refraction | 1.70 | “Dupont Kapton Polyimide Film General Specifications,
  Bulletin GS-96-7”.  http://www.dupont.com/kapton/general/H-38479-4.pdf |  | 
| Electrical conductivity | 1.5e17 Ωcm | “Dupont Kapton Polyimide Film General
  Specifications, Bulletin GS-96-7”. 
  http://www.dupont.com/kapton/general/H-38479-4.pdf |  | 
| Magnetic permeability |  |  |  | 
| Piezoresistivity (if a  conductor) |  |  |  | 
| Piezoelectricity coefficient | 3.8e-12c/N (in abstract) 3.8e-3c/N in table in body of
  paper | Tong, Yuejin, et. al.  “Preparation
  and properties of polyimide films codoped with
  barium and titanium oxides.” |  | 
| Wet etching
  method | TMAH developer can be used to
  develop exposed photoresist and etch unmasked underlying polyimide in one
  step. | “Product
  Bulletin PI-2545 Wet Etch Polyimide.” 
  http://www.hdmicrosystems.com |  | 
| Plasma etching
  method | Use PECVD silicon nitride mask
  and use O2 plasma etch, possibly with CF4 | Lee, Y.K. et al. 
  “Reactive Ion Etich of the Fluorinated
  Polyimide Film.”  Advanced
  Metallization for Future ULSI. 
  Symposium, 1996, p 455-61. 
  Abstract. |  | 
| Adhesion to silicon dioxide | Varies; “A separate adhesion
  promoter is recommended with PI-2525, PI-2555, PI-2556 to promote adhesion to
  oxides and metals.  PI-2575 is self
  priming and does not require an adhesion promoter.” | “Product Information Pyralin
  PI2525, PI2555, PI-2575 & PI2556.” 
  http://www.hdmicrosystems.com |  | 
| Biocompatibility | Used in Bio-MEMS an implantable
  intracortical electrode array. “Polyimide
  also provides an ideal surface for the selective attachment of various
  important bioactive species onto the device in order to encourage favorable
  long-term reactions at the tissue-electrode interface.”  “Overall polyimide is a proven  biocompatible material and an
  excellent choice for neuroprosthetic applications.” | 
 | Can be found
  using IEEE Xplore | 
| Hydrophobicity | 82 degrees | Ghosh,  |  | 
| Melting point | Does
  not melt, Decomposes
  at 520°C | “Dupont Kapton Polyimide Film General
  Specifications, Bulletin GS-96-7”. 
  http://www.dupont.com/kapton/general/H-38479-4.pdf |  |